Group IV–V layered semiconductors
SiP, SiAs, GeP, GeAsAlso called GeAs, GeP, SiAs, SiP
Anisotropic 2D semiconductors that are not black phosphorus. Their layers have two inequivalent in-plane directions, so conduction, absorption and Raman response all depend on which way the crystal is turned – useful for polarisation-sensitive detectors – and unlike black phosphorus they are stable enough to handle. GeP photodetectors work into the short-wave infrared and have been built directly onto silicon photonics.
Crystal structure
Three layers of SiP. Each layer is turned by 180° against the one below, so every second layer repeats: 6.83 Å between layers. Cell from Li and colleagues, CrystEngComm (2017); COD 7229436.
- P
- Si
- Cell
- Rectangular, a = 3.53 Å, b = 20.56 Å
- Atoms per cell
- 24
- Si–P bonds
- 2.26–2.30 Å
- Si–Si bond
- 2.34 Å
- Height
- 4.69 Å between the outer atom centres
Key properties
- Strong in-plane anisotropy in both optics and transport, measurable by angle-resolved Raman and reflectance-difference microscopy
- Micaceous crystals that exfoliate into flakes, with millimetre-sized crystals of GeP, GeAs and SiAs available
- Few-layer GeAs transistors show clearly direction-dependent transport
- Multilayer GeP phototransistors respond from the ultraviolet into the short-wave infrared, with ~25 A W−1 at 1,310 nm
- Resistivity follows two-dimensional variable-range hopping, and the compounds keep their structure down to 5 K
How it is made
- High-pressure melt growth (0.5–1 GPa) in a cubic anvil press, which gives large shiny crystals of GeP, GeAs and SiAs; SiP comes out small and brittle
- Chemical vapour transport with iodine from sintered precursors
- Mechanical exfoliation into flakes, and transfer onto silicon waveguides for photonic devices
Uses, and how close they are
- Polarisation-sensitive and short-wave infrared photodetectorslab
- On-chip photodetectors integrated with silicon photonicslab
- Anisotropic thermoelectric and thermal-management studieslab
Readiness runs lab → prototype → pilot → deployed.
Open problems
- How large is the intrinsic mobility, and how much of the measured transport is hopping between defects rather than band conduction?
- Can crystals be grown without the high-pressure step, in sizes and quality that support device work?
- Do monolayers behave as the calculations predict, and can they be isolated reliably?
- Which member of the family is the best infrared detector – the comparison has not been made under common conditions
Going deeper
Short notes for specialists. Choose a lens in the header and yours comes first.
Low-symmetry layers with two inequivalent in-plane axes: effective masses, dielectric response and phonons all become tensors, and comparisons with experiment need the crystal orientation stated. The bonding mixes group-IV–group-IV and group-IV–pnictogen bonds in the same sheet, so band edges are not simply pnictogen-derived. Because measured transport shows variable-range hopping, intrinsic-mobility calculations should be compared with care – the samples are probably disorder-limited.
Identify the crystal axes before anything else: angle-resolved polarised Raman and reflectance-difference microscopy both work and are quick. Report the angle with every transport or photoresponse number, since the anisotropy is the point. Growth history matters too – high-pressure melt growth and iodine vapour transport give different defect levels, and the hopping transport that dominates below room temperature is a defect signature.
A practical appeal – air-stable, polarisation-sensitive detection in the near and short-wave infrared, demonstrated on silicon photonics – against an impractical supply chain: the best crystals come from a high-pressure press, and nothing here is grown at wafer scale. Treat as a materials option for specialised detectors rather than a platform.
In the research tracks
Growth methods
Key references
- High-pressure melt growth and transport properties of SiP, SiAs, GeP, and GeAs 2D layered semiconductorscited by 170doi:10.1016/j.jcrysgro.2016.03.019
- Highly in-plane optical and electrical anisotropy of 2D germanium arsenidecited by 174doi:10.1002/adfm.201707379
- Multilayer 2D germanium phosphide (GeP) infrared phototransistorcited by 23doi:10.1364/OE.420431